The most critical factor in the maintenance of etching equipment is to ensure that the nozzle is clean and free of obstructions to make the jet unobstructed. Clogging or slagging will impact the layout under the action of jet pressure. If the nozzle is not clean, it will cause uneven etching and scrap the entire PCB. Obviously, equipment maintenance is the replacement of damaged and worn parts, including replacement of nozzles. The nozzles also have the problem of wear. In addition, the more critical issue is to keep the etching machine free of slagging. In many cases, slagging will accumulate. Excessive slagging will even affect the chemical balance of the etching solution. Similarly, if there is excessive chemical imbalance in the etching solution, slagging will become more serious. The problem of slag accumulation cannot be overemphasized. Once a large amount of slagging occurs suddenly in the etching solution, it is usually a signal that there is a problem with the balance of the solution. This should be done with strong hydrochloric acid for proper cleaning or supplementation of the solution.
Residual film can also produce slagging, a very small amount of residual film dissolves in the etching solution, and then forms copper salt precipitation. The slagging formed by the residual film indicates that the previous film removal process is not complete. Poor film removal is often the result of edge film and over-plating.
In the processing technology of the outer circuit of the printed circuit board, there is another method, which is to use the photosensitive film instead of the metal coating as the resist layer. This method is very similar to the inner layer etching process, and you can refer to the etching in the inner layer manufacturing process. At present, tin or lead-tin is the most commonly used anti-corrosion layer, used in the etching process of ammonia-based etchant. Ammonia-based etchant is a commonly used chemical liquid, and does not have any chemical reaction with tin or lead-tin. Ammonia etchant mainly refers to ammonia/ammonium chloride etching solution. In addition, ammonia/ammonium sulfate etching chemicals are also available on the market.
After using the sulfate-based etching solution, the copper in it can be separated by electrolysis, so it can be reused. Because of its low corrosion rate, it is generally rare in actual production, but it is expected to be used in chlorine-free etching. Someone tried to use sulfuric acid-hydrogen peroxide as an etchant to corrode the outer layer pattern. Due to many reasons including economy and waste liquid treatment, this process has not been widely used in a commercial sense. Furthermore, sulfuric acid-hydrogen peroxide cannot be used for the etching of lead-tin resist, and this process is not PCB The main method in outer layer production.
The structure of the etching equipment and the etching solutions of different compositions will affect the etching factor or the degree of side etching, which can be controlled. The use of certain additives can reduce the degree of side erosion. The chemical composition of these additives is generally a trade secret, and the respective developers do not disclose it to the outside world.
In many ways, the quality of etching has existed long before the printed board enters the etching machine. Because there are very close internal connections between the various processes or processes of printed circuit processing, there is no process that is not affected by other processes and does not affect other processes. Many of the problems identified as etching quality actually existed in the process of removing the film or even before. For the etching process of the outer layer graphics, because the "inverted stream" phenomenon it embodies is more prominent than most printed board processes, many problems are finally reflected in it. At the same time, this is also because the etching is the last step in a long series of processes starting with self-sticking and photosensitive, after which the outer layer pattern is successfully transferred. The more links, the greater the possibility of problems. This can be seen as a very special aspect of the printed circuit production process.
In the process of processing printed circuits by pattern electroplating, the ideal state should be: the total thickness of the electroplated copper and tin or copper and lead tin should not exceed the thickness of the electroplating resistant photosensitive film, so that the electroplated pattern is completely covered on both sides of the film. The "wall" blocks and is embedded in it. However, in actual production, after electroplating printed circuit boards all over the world, the plating pattern is much thicker than the photosensitive pattern. In the process of electroplating copper and lead-tin, because the plating height exceeds the photosensitive film, a tendency of lateral accumulation occurs, and the problem arises from this. The tin or lead-tin resist layer covering the lines extends to both sides to form a "edge", covering a small part of the photosensitive film under the "edge".
The "edge" formed by tin or lead tin makes it impossible to completely remove the photosensitive film when removing the film, leaving a small part of "residual glue" under the "edge". The "residual glue" or "residual film" left under the "edge" of the resist will cause incomplete etching. The lines formed "copper roots" on both sides after etching. The copper roots narrowed the line spacing, causing the printed board to not meet the requirements of Party A, and may even be rejected. Rejection will greatly increase the production cost of PCB. In addition, in many cases, due to the formation of dissolution due to the reaction, in the printed circuit industry, the residual film and copper may also form and accumulate in the corrosive liquid and be blocked in the nozzle of the corroding machine and the acid-resistant pump, and it has to be shut down for processing and cleaning., Which affects work efficiency.
In printed circuit processing, ammonia etching is a relatively delicate and complex chemical reaction process. On the other hand, it is an easy job. Once the process is up-regulated, production can be continued. The key is to maintain continuous working status once it is turned on. The etching process depends to a large extent on the good working condition of the equipment. At present, no matter what etching solution is used, high-pressure spray must be used, and in order to obtain a neater line side and high-quality etching effect, the nozzle structure and spray method must be strictly selected.
In order to obtain good side effects, many different theories have appeared, forming different design methods and equipment structures. All theories about etching recognize the most basic principle, which is to keep the metal surface in constant contact with fresh etching solution as quickly as possible. The chemical mechanism analysis of the etching process also confirmed the above point of view. In ammonia etching, assuming that all other parameters remain unchanged, the etching rate is mainly determined by the ammonia (NH3) in the etching solution. Therefore, using fresh solution to etch the surface has two main purposes: one is to flush out the copper ions that have just been produced; the other is to continuously provide ammonia (NH3) needed for the reaction.
In the traditional knowledge of the printed circuit industry, especially the suppliers of printed circuit raw materials, it is recognized that the lower the monovalent copper ion content in the ammonia etching solution, the faster the reaction speed. This has been confirmed by experience. . In fact, many ammonia-based etching solution products contain special ligands for monovalent copper ions (some complex solvents), whose role is to reduce monovalent copper ions (these are the technical secrets of their products with high reactivity ), it can be seen that the influence of monovalent copper ions is not small. If the monovalent copper is reduced from 5000ppm to 50ppm, the etching rate will be more than doubled.
This is a functional reason for passing air into the etching box. However, if there is too much air, it will accelerate the loss of ammonia in the solution and decrease the pH value, resulting in a decrease in the etching rate. Ammonia in the solution is also the amount of change that needs to be controlled. Some users adopt the method of passing pure ammonia into the etching reservoir. To do so, a set of PH meter control system must be added. When the automatically measured PH result is lower than the given value, the solution will be added automatically.
In the related field of chemical etching (also known as photochemical etching or PCH), research work has begun and has reached the stage of etching machine structure design. In this method, the solution used is divalent copper, not ammonia-copper etching. It may be used in the printed circuit industry. In the PCH industry, the typical thickness of etched copper foil is 5 to 10 mils, and in some cases the thickness is quite large. Its requirements for etching parameters are often more stringent than those in the PCB industry.